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1 article(s) from Korenivski, Vladislav

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

Adrian Iovan,
Marco Fischer,
Roberto Lo Conte and
Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

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Figure 1: Tapping-mode atomic force microscopy images of a typical monolayer, with the particle diameter (and...

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Figure 2: Illustration of the four steps in down-scaling of the particles of a polystyrene monolayer to the 1...

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Figure 3: Polystyrene nanoparticles monolayer after plasma-ICP etching for (a) 165, (b) 180, and (c) 195 seco...

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Figure 4: SEM images of a typical colloidal-monolayer mask, shown on four scales in (a–d). The average interd...

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Figure 5: (a) ) Illustration of the integrated circuit device produced by using a colloidal nanoarray mask an...

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Published 19 Dec 2012

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